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The Institute of Theoretical and Applied Mechanics
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Original version of the author's contribution as presented on CD, page 3156, code TS.FS03-3.04 .:
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Residual stress analysis in si-based multi-layer heterostructure by micro-raman
Qiu, Wei
Si-based multilayer semiconductor heterostructures are widely used in microelectronics. Inhomogeneous residual stress is induced during their preparation In this work, a [...]
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